Abstract: The process of chemical mechanical polishing of cerium-based polishing powder was studied by orthogonal test. With polishing time, rotation speed of polishing speed, polishing slurry solid content and polishing slurry pH value as controllable factors, their effects on cutting rate and scratch degree of cerium-based polishing powder were analyzed. Taking the subjective and objective weights of each response into consideration, we established a multi-response robust optimization design model by combining the signal-to-noise ratio and satisfaction function. The optimal combination of process parameters ensures the robustness of the polishing process. Thus, the purpose of preparing high-performance rare earth polishing slurry can be achieved. The optimization results show that this method is effective in solving the problem of robust optimization with multiple response variables, which provides reference for related production and processing enterprises in improving process quality.