Microstructures and tribological properties of a-C:H film prepared by DC reactive magnetron sputtering

Liu Long; Zhou Shengguo; Wang Yuechen; Liu ZhengBing; Ma LiQiu

doi:10.13264/j.cnki.ysjskx.2016.01.009

Volume 7 Issue 1

Feb. 2016

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Nonferrous Metals Science and Engineering > 2016 > 7(1): 41-47. > DOI: 10.13264/j.cnki.ysjskx.2016.01.009

Liu Long, Zhou Shengguo, Wang Yuechen, Liu ZhengBing, Ma LiQiu. Microstructures and tribological properties of a-C:H film prepared by DC reactive magnetron sputtering[J]. Nonferrous Metals Science and Engineering, 2016, 7(1): 41-47. DOI: 10.13264/j.cnki.ysjskx.2016.01.009

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Microstructures and tribological properties of a-C:H film prepared by DC reactive magnetron sputtering

School of Material Science and Engineering, Jiangxi University of Science and Technology, Ganzhou 341000, China

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Received Date: July 29, 2015
Published Date: February 28, 2016

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A series of a-C:H films were deposited on silicon p(100) wafer and stainless steel substrates by DC reactive magnetron sputtering using graphite targets in an argon and methane atmosphere with different methane flow rate. Microstructures, mechanical and tribological properties were characterized systemically by FESEM, AFM, Raman spectroscopy, nano-indentation, CSM scratch tester and tribo-tester. The results showed that there was a lightly tendency of density of the a-C:H film with initially increase and then decrease as the increase of methane flow rate. The deposition rate of a-C:H film presented an increase as the increase of methane flow rate while the increase range was gradually reduced. Besides, the sp³ bond content, the nano-hardness and Young's modulus were increased at the initial stage and then decreased with the increase of methane flow. Frictional and wear behaviors showed that the a-C:H film deposited at the methane flow rate of 8 sccm was achieved low friction coefficient with 0.20 and high anti-wear with 6.48×10^-7mm³(N·m).
- Magnetron sputtering,
- a-C:H film,
- Microstructure,
- Friction and wear

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