Titanium film sputtering depostion on 201 stainless steel free of Ni

Ti film was deposited at the room temperature by DC magnetron sputtering on low-cost 201 stainless steel free of Ni. The effects of deposition conditions on the structure and appearance of Ti film on 201 stainless steel were analyzed through XRD and SEM. The results showed that the film microstructure was closely correlated with the deposition parameters. The closely aligned cyberlink crystal was observed at 78.4 W of sputtering power, but porosity was being produced at stronger power. High orientation was determined by XRD but lattice plane with the orientation was not exclusive with different variable process parameters. It was also determined by XRD that the more serious lattice distortion of the base was found because of Ti atom infiltration. Moreover, the possibility that the film thickness could be characterized by the deposition quantity and the effects of parameters on the deposition quantity were also discussed.